電子槍（電子損失譜，俄歇電子能譜可用）
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光刻機，鍍膜機，磁控濺射鍍膜儀，電子束蒸發(fā)鍍膜儀，開爾文探針系統(tǒng)(功函數(shù)測量)，氣溶膠設(shè)備，氣溶膠粒徑譜儀，等離子增強氣相沉積系統(tǒng)(PECVD)，原子層沉積系統(tǒng)(ALD)，快速退火爐，氣溶膠發(fā)生器，稀釋器，濾料測試系統(tǒng)
電子槍（電子損失譜，俄歇電子能譜可用）
ELS100型：（電子損失譜）
¨ Low Energy Electron Gun designed for Electron Loss Spectroscopy(ELS)
¨ Beam Energy variable 5 to 100eV
¨ Low Energy Spread ~ 0.25eV FWHM using LaB6 or BaO filament
¨ 1mm typical spot size
¨ Beam current monitor with sample biasing voltage
¨ Mu-metal magnetic screen.
電子槍（電子損失譜，俄歇電子能譜可用）
¨ Front Panel Control of Kinetic Energy, Filament Current, Wehnelt (Grid), Anode, Focus and Beam Deflection
¨ External Kinetic Energy sweep (e.g. by Computer Control)
¨ X-Y static deflectors for beam positioning on sample
¨ Mounting flange : 70mm (2.75”) OD CF
¨ Manufactured to suit your chamber sample – flange distance
¨ Bakeable UHV compatible construction with single multiway electrical feedthrough
ELS5000型：（俄歇電子能譜）
¨ Ideal for Static Auger Electron Spectroscopy AES
¨ Beam Energy variable 0 to 5000eV
¨ Beam current range 10nA to 30mA
¨ Beam current monitor with sample biasing voltage
¨ Typical spot size < 50mm with 1mA beam current (measured at 2keV beam energy with a typical working distance of 50mm)
¨ Working distance 15 to 500mm
¨ X-Y static deflectors for beam positioning on sample
¨ Mounting flange : 70mm (2.75”) OD CF
¨ Suitable for ports with sample - flange distance up to 750mm
¨ Bakeable UHV compatible construction
¨ Single multiway feedthrough with locking connector
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